X-ray absorption study of the atomic environment in Sb[sup +] and Sb[sup +]/B[sup +] implanted

Allain, J.L.; Bourret, A.
July 1992
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p264
Academic Journal
Examines the electrical deactivation of antimony atoms implanted in crystalline silicon by extended x-ray absorption fine structure method. Description of the deactivation process; Existence of vacancy complexes; Suspension of the precipitation of antimony particles; Formation of antimony-boron pairs; Stabilization of the complexes.


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