Bombardment energies of O[sup +][sub 2] in low pressure reactive ion etching

Janes, Joachim; Huth, Christoph
July 1992
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p261
Academic Journal
Examines the energy distributions of oxygen on the substrate plane of a parallel plate reactive ion etching reactor using quadrupole mass spectroscopy. Result of charge exchange collisions in the plasma sheath; Explanation on the structures found in energy distributions; Effect of scattering on the plasma sheath.


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