TITLE

Bombardment energies of O[sup +][sub 2] in low pressure reactive ion etching

AUTHOR(S)
Janes, Joachim; Huth, Christoph
PUB. DATE
July 1992
SOURCE
Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p261
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the energy distributions of oxygen on the substrate plane of a parallel plate reactive ion etching reactor using quadrupole mass spectroscopy. Result of charge exchange collisions in the plasma sheath; Explanation on the structures found in energy distributions; Effect of scattering on the plasma sheath.
ACCESSION #
4254897

 

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