High mobility hydrogenated and oxygenated microcrystalline silicon as a photosensitive material

Faraji, M.; Gokhale, Sunil
June 1992
Applied Physics Letters;6/29/1992, Vol. 60 Issue 26, p3289
Academic Journal
Examines the preparation of hydrogenated and oxygenated microcrystalline silicon by radio frequency glow discharge method. Use of a mixture of silane, hydrogen, and oxygen; Determination of the Hall mobility for the films; Loss of photocarriers by the recombination process at the junction.


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