Evaluation of surface roughness of technological InP substrates by in situ scanning tunneling

Robach, Y.; Phaner, M.
November 1992
Applied Physics Letters;11/23/1992, Vol. 61 Issue 21, p2551
Academic Journal
Examines the use of in situ scanning tunneling microscopy imaging in evaluating the surface roughness of technological indium phosphide (InP) substrates. Effect of InP acidic solutions on free surface; Exposure of oxide-free InP surface to rapid air reoxidation; Influence of ultraviolet native oxide on InP topography.


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