Barrier parameter variation in Al-Al[sub 2]O[sub 3]-metal tunnel junctions

Shu, Q.Q.; Ma, W.G.
November 1992
Applied Physics Letters;11/23/1992, Vol. 61 Issue 21, p2542
Academic Journal
Analyzes the potential barrier parameter variation in aluminum-aluminum oxide metal tunnel junctions. Formation of aluminum oxide layer following plasma oxidation of the aluminum film electrodes; Deposition of copper film strips in the metal electrodes; Effects of barrier parameter variation on the tunneling behavior of electrons.


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