TITLE

Selective low pressure chemical vapor deposition of copper: Effect of added water vapor in

AUTHOR(S)
Lecohier, B.; Calpini, B.
PUB. DATE
June 1992
SOURCE
Applied Physics Letters;6/22/1992, Vol. 60 Issue 25, p3114
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the low pressure chemical vapor deposition of copper from bis-hexafluoroacetylacetonate on oxidized silicon substrates. Growth rates of the copper films; Chemical purity and electrical conductivity of the copper deposits; Influence of the substrate adsorption-desorption properties on the process.
ACCESSION #
4250542

 

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