TITLE

Localized fabrication of Si nanostructures by focused ion beam implantation

AUTHOR(S)
Steckl, A.J.; Mogul, H.C.
PUB. DATE
April 1992
SOURCE
Applied Physics Letters;4/13/1992, Vol. 60 Issue 15, p1833
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Describes the localized fabrication of silicon (Si) nanostructure by focused ion beam (FIB) implantation. Application of chemical etching on as-implanted Si nanostructure; Effect of FIB implantation on Si susceptibility to chemical etching; Formation of cantilever structure by implanted layer.
ACCESSION #
4250487

 

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