Nanolithography with an atomic force microscope for integrated fabrication of quantum

Wendel, M.; Kuhn, S.
October 1994
Applied Physics Letters;10/3/1994, Vol. 65 Issue 14, p1775
Academic Journal
Describes a technique for integrating nanometer-scale lithography on various mask materials. Use of atomic force microscope; Transfer of the generated patterns to the two-dimensional electron gas; Fabrication of hole arrays; Observation of commensurability oscillations.


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