TITLE

Nanolithography with an atomic force microscope for integrated fabrication of quantum

AUTHOR(S)
Wendel, M.; Kuhn, S.
PUB. DATE
October 1994
SOURCE
Applied Physics Letters;10/3/1994, Vol. 65 Issue 14, p1775
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Describes a technique for integrating nanometer-scale lithography on various mask materials. Use of atomic force microscope; Transfer of the generated patterns to the two-dimensional electron gas; Fabrication of hole arrays; Observation of commensurability oscillations.
ACCESSION #
4241390

 

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