TITLE

Filament activated chemical vapor deposition of boron carbide coatings

AUTHOR(S)
Deshpande, Sadanand V.; Gulari, Erdogan
PUB. DATE
October 1994
SOURCE
Applied Physics Letters;10/3/1994, Vol. 65 Issue 14, p1757
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Evaluates the use of hot filament chemical vapor deposition (HFCVD) on low temperature deposition of amorphous boron carbide thin films. Components of the deposited boron carbide films; Presence of high concentration of atomic hydrogen in HFCVD; Indication of HFCVD as a simple deposition scheme to study tribological properties.
ACCESSION #
4241384

 

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