TITLE

Magnetron sputter deposition with high levels of metal ionization

AUTHOR(S)
Rossnagel, S.M.; Hopwood, J.
PUB. DATE
December 1993
SOURCE
Applied Physics Letters;12/13/1993, Vol. 63 Issue 24, p3285
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the development of magnetron sputter deposition technique with high levels of metal ionization. Observation of significant cooling of the plasma electron temperature; Combination of conventional magnetron sputter deposition with radio frequency inductively coupled (RFI) plasma; Location of RFI plasma.
ACCESSION #
4241298

 

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