Magnetron sputter deposition with high levels of metal ionization

Rossnagel, S.M.; Hopwood, J.
December 1993
Applied Physics Letters;12/13/1993, Vol. 63 Issue 24, p3285
Academic Journal
Examines the development of magnetron sputter deposition technique with high levels of metal ionization. Observation of significant cooling of the plasma electron temperature; Combination of conventional magnetron sputter deposition with radio frequency inductively coupled (RFI) plasma; Location of RFI plasma.


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