TITLE

Rapid thermal chemical vapor deposition of thin silicon oxide films using silane and nitrous oxide

AUTHOR(S)
Xu, X.L.; Kuehn, R.T.
PUB. DATE
June 1992
SOURCE
Applied Physics Letters;6/15/1992, Vol. 60 Issue 24, p3063
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the rapid thermal chemical vapor deposition of thin silicon oxide films. Use of electron microscopy and backscattering spectroscopy in observing stoichiometric composition; Determination of oxide film thickness by ellipsoidal measurements; Value of the average catastrophic breakdown field.
ACCESSION #
4241285

 

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