TITLE

Reactive ion etching of ZnSe by gas mixture of ethane and hydrogen

AUTHOR(S)
Ohtsuka, K.; Imaizumi, M.
PUB. DATE
June 1992
SOURCE
Applied Physics Letters;6/15/1992, Vol. 60 Issue 24, p3025
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Focuses on reactive ion etching of zinc selenide (ZnSe) by gas mixture of ethane and hydrogen. Growth of ZnSe epitaxial layers by gas source molecular beam epitaxy; Analysis of the ethane concentration dependence of surface morphologies; Use of scanning electron microscopy.
ACCESSION #
4241272

 

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