Fine line structures of ceramic films formed by patterning of metalorganic precursors using

Hung, L.S.; Zheng, L.R.
May 1992
Applied Physics Letters;5/4/1992, Vol. 60 Issue 18, p2210
Academic Journal
Examines the fabrication of fine line structures of ceramic thin films by patterning of the metalorganic precursor films using photolithography. Development of trilevel structure with an outer resist layer and a silver delineated layer; Effect of ion irradiation on metal carboxylates and precursor film; Application of ion patterning technique.


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