Examination of Si(100) surfaces treated by ultrapure water with 5 ppb dissolved oxygen

Kanaya, H.; Usuda, K.
July 1995
Applied Physics Letters;7/31/1995, Vol. 67 Issue 5, p682
Academic Journal
Examines the silicon surfaces treated by ultrapure water with 5 parts per billion dissolved oxygen concentration. Examination through infrared spectroscopy and high energy electron diffraction; Dependence of surface morphology on pH value and amount of etching; Appearance of facets after rinsing.


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