Misfit dislocation propagation kinetics in Ge[sub x]Si[sub 1-x]/Ge(100) heterostructures

Hull, R.; Bean, J.C.
July 1994
Applied Physics Letters;7/18/1994, Vol. 65 Issue 3, p327
Academic Journal
Measures the misfit dislocation propagation kinetics in Ge[sub x]Si[sub 1-x]/Ge(100) heterostructures. Comparison with previous measurement of germanium (Ge) concentration layer in silicon (Si)(100) substrates; Characterization of the misfit dislocation velocity; Interpolation between the bulk values for Si and Ge.


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