TITLE

Monolayer chemical beam etching: Reverse molecular beam epitaxy

AUTHOR(S)
Tsang, W.T.; Chiu, T.H.
PUB. DATE
December 1993
SOURCE
Applied Physics Letters;12/20/1993, Vol. 63 Issue 25, p3500
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Develops a monolayer chemical beam etching process. Capability and versatility of a chemical beam epitaxial system; Reversal of the molecular beam epitaxy process; Addition of in situ reflection high-energy electron diffraction to achieve etching capability.
ACCESSION #
4240902

 

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