Laser-assisted organometallic chemical vapor deposition of films of rhodium and iridium

Cohan, Judson S.; Haojie Yuan
March 1992
Applied Physics Letters;3/16/1992, Vol. 60 Issue 11, p1402
Academic Journal
Explores the organometallic chemical vapor deposition of rhodium and iridium thin films. Precursor of the films; Causal mechanism for the deposition of rhodium films; Usage of x-ray diffraction and x-ray photoelectron spectroscopy.


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