TITLE

Refractive index determination of SiGe using reactive ion etching/ellipsometry: Application for

AUTHOR(S)
Kroesen, G.M.W.; Oehrlein, G.S.
PUB. DATE
March 1992
SOURCE
Applied Physics Letters;3/16/1992, Vol. 60 Issue 11, p1351
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the complex refractive index of silicon germanide layers on silicon substrates. Use of in situ ellipsometry during reactive ion etching; Determination of the germanium concentration; Inversion of the ellipsometry equations.
ACCESSION #
4240684

 

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