TITLE

Initial stages of native oxide growth on hydrogen passivated Si(111) surfaces studied by

AUTHOR(S)
Neuwald, U.; Hessel, H.E.
PUB. DATE
March 1992
SOURCE
Applied Physics Letters;3/16/1992, Vol. 60 Issue 11, p1307
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the initial stages of native oxide on hydrogen passivated silicon(111) surfaces. Use of scanning tunneling microscopy; Formation of three-dimensional oxide nuclei at the step edges; Relation of the surface nuclei to surface defects or contamination.
ACCESSION #
4240670

 

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