Beam profile reflectometry: A new technique for dielectric film measurements

Rosencwaig, Allan; Opsal, Jon
March 1992
Applied Physics Letters;3/16/1992, Vol. 60 Issue 11, p1301
Academic Journal
Describes a technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Adaptation of the variable angle reflectometry; Provision of excellent precision for films; Performance of the measurements with a submicron spot size.


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