TITLE

Plasma etched polycrystalline hot-filament chemical vapor deposited diamond thin films and their

AUTHOR(S)
Liaw, B.Y.; Stacy, T.
PUB. DATE
November 1994
SOURCE
Applied Physics Letters;11/28/1994, Vol. 65 Issue 22, p2827
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates corona discharge plasma etching of hot-filament chemical vapor deposited diamond thin films grown on single crystal silicon substrates. Indication of the high etch rate and roughness measurements; Manifestation of the electrical measurements on etched films; Evaluation of the diamond surfaces electrical properties in various treatments.
ACCESSION #
4233206

 

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