TITLE

Preparation and analysis of the negative resistance characteristic in an amorphous silicon and

AUTHOR(S)
Chen, K.H.; Fang, Y.K.
PUB. DATE
November 1994
SOURCE
Applied Physics Letters;11/28/1994, Vol. 65 Issue 22, p2815
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents the experimental and theoretical studies on the characteristics of negative differential resistance (NDR) in an amorphous silicon based single-barrier device. Specification of NDR to the barrier thickness; Importance of barrier thickness to current-voltage characteristics; Discussion on the NDR amorphous silicon single-barrier device.
ACCESSION #
4233202

 

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