Fabrication of visibly photoluminescent Si microstructures by focused ion beam implantation and

Xu, J.; Steckl, A.J.
October 1994
Applied Physics Letters;10/17/1994, Vol. 65 Issue 16, p2081
Academic Journal
Examines the fabrication of optically active silicon (Si) microstructures embedded in a crystalline Si substrate. Realization of photonic integrated circuits; Combination of Si microstructure fabrication by localized high dose gallium focused ion beam implantation; Attainment of self-selective porous Si formation of the microstructures.


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