TITLE

Activation energy for C94 and C54 TiSi[sub 2] formation measured during rapid thermal annealing

AUTHOR(S)
Colgan, E.G.; Clevenger, L.A.
PUB. DATE
October 1994
SOURCE
Applied Physics Letters;10/17/1994, Vol. 65 Issue 16, p2009
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Measures activation energies for C49 and C54 titanium disilicide formation during rapid thermal annealing. Resistivity of gate and local interconnect metallizations in integrated circuits; Measurement of temperature corresponding to a fixed stage of transformation; Evaporation of titanium films on undoped polycrystalline silicon.
ACCESSION #
4233149

 

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