Characterization of interface topography of the buried Si-SiO[sub 2] interface in

Crowder, S.W.; Griffin, P.B.
September 1994
Applied Physics Letters;9/26/1994, Vol. 65 Issue 13, p1698
Academic Journal
Characterizes the topography of the buried silicon-silicon dioxide interface using atomic force microscopy. Implication of the interface properties for the processing and device performance; Measurement of the root-mean-square surface roughness; Adjustment of the scan rate and setpoint voltage to yield quality images.


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