TITLE

Stress relaxation in plasma deposited tungsten nitride/tungsten bilayer

AUTHOR(S)
Chang Woo Lee; Yong Tae Kim
PUB. DATE
August 1994
SOURCE
Applied Physics Letters;8/22/1994, Vol. 65 Issue 8, p965
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates stress relaxation in plasma deposited tungsten nitride/tungsten (W [sub 67]N[sub 33]/W) bilayer films. Variation of the magnitude of stress; Method for reducing the high tensile stress of a tungsten film; Role of interfacial pseudodiffusion in the stress relaxation of the W[sub 67]N[sub 33]/W bilayer.
ACCESSION #
4233067

 

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