TITLE

True oxide electron beam induced current for low-voltage imaging of local defects in very thin

AUTHOR(S)
Lau, W.S.; Chan, D.S.H.
PUB. DATE
October 1993
SOURCE
Applied Physics Letters;10/18/1993, Vol. 63 Issue 16, p2240
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Observes true oxide electron beam induced current (TOEBIC) for local defects in thin silicon dioxide films. Analysis of TOEBIC at low electric field; Effects of electron hole pairs on TOEBIC; Differences between TOEBIC and tunneling current microscopy.
ACCESSION #
4233035

 

Related Articles

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics