Mo[sub 0.5]Si[sub 0.5]/Si multilayer soft x-ray mirrors, high thermal stability, and normal

Stock, H.-J.; Kleineberg, U.
October 1993
Applied Physics Letters;10/18/1993, Vol. 63 Issue 16, p2207
Academic Journal
Fabricates the Mo[sub 0.5]Si[0.5]/silicon (Si) multilayer soft x-ray mirrors by electron beam evaporation in ultrahigh vacuum. Characteristics of the incidence mirrors; Comparison with multilayers of pure molybdenum (Mo) and Si; Destruction of Mo/Si multilayers at 600 degree Celsius.


Related Articles

  • Electron-beam-induced pattern etching of AlGaAs using an ultrathin GaAs oxide as a resist. Taneya, M.; Sugimoto, Y.; Hidaka, H.; Akita, K. // Journal of Applied Physics;10/1/1990, Vol. 68 Issue 7, p3630 

    Describes the electron beam (EB)-induced pattern etching of Al[subx]Ga[sub1-x]As. Illustration of the ultrahigh vacuum multichamber system used in the experiment; Surface profile of the sample; Results and discussion.

  • Brookhaven National Laboratory electron beam test stand. Pikin, A.; Prelec, K.; Snydstrup, L.; Kponou, A.; Alessi, J.; Beebe, E. // Review of Scientific Instruments;Feb1998, Vol. 69 Issue 2, p697 

    Describes the electron beam test stand (EBTS) in Upton, New York. Construction of a device to develop high intensity electron beam ion source (EBIS) technologies; Presence of EBIS attributes in the EBTS; Employment of the ultrahigh vacuum technology in the drift tube structure.

  • Novel in situ pattern etching of GaAs by electron-beam-stimulated oxidation and subsequent Cl2 gas etching. Sugimoto, Y.; Taneya, M.; Akita, K.; Kawanishi, H. // Journal of Applied Physics;2/15/1991, Vol. 69 Issue 4, p2725 

    Examines a method for in situ pattern etching of gallium arsenide by using an electron-beam (EB)-stimulated-oxidized surface layer. Resistance of the oxide mask against chlorine gas etching; Use of a ultrahigh vacuum multichamber system without exposing the wafer surface to air; EB-irradiation...

  • The Heidelberg CSR: Stored Ion Beams in a Cryogenic Environment. Wolf, A.; von Hahn, R.; Grieser, M.; Orlov, D. A.; Fadil, H.; Welsch, C. P.; Andrianarijaona, V.; Diehl, A.; Schröter, C. D.; López-Urrutia, J. R. Crespo; Rappaport, M.; Urbain, X.; Weber, T.; Mallinger, V.; Haberstroh, Ch.; Quack, H.; Schwalm, D.; Ullrich, J.; Zajfman, D. // AIP Conference Proceedings;2006, Vol. 821 Issue 1, p473 

    A cryogenic electrostatic ion storage ring CSR is under development at the Max-Planck Institute for Nuclear Physics in Heidelberg, Germany. Cooling of the ultrahigh vacuum chamber is envisaged to lead to extremely low pressures as demonstrated by cryogenic ion traps. The ring will apply electron...

  • Multilayer coated laminar gratings in the soft x-ray region. Ishiguro, Eiji; Kawashima, Tsutomu; Yamashita, Koujun; Kunieda, Hideyo; Yamazaki, Takashi; Sato, Kuninori; Koeda, Masaru; Nagano, Tetsuya; Sano, Kazuo // Review of Scientific Instruments;Feb1995, Vol. 66 Issue 2, p2112 

    Presents reflectivities and diffraction efficiencies of platinum/carbon (Pt/C) multilayer coated laminar gratings measured in 1.2-2.8 keV and 8.05 keV. Use of an electron beam evaporation method in an ultrahigh vacuum to deposit a Pt/C multilayer on a laminar grating; Groove depth of gratings.

  • Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. Lim, Y.C.; Westerwalbesloh, T.; Aschentrup, A.; Wehmeyer, O.; Haindl, G.; Kleineberg, U.; Heinzmann, U. // Applied Physics A: Materials Science & Processing;2001, Vol. 72 Issue 1, p121 

    Abstract. Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth change E less than or equal to 3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (GAMMA = d[sub Abs/d[sub Sp] + d[sub Abs]) between the absorber layer and the...

  • Influence of irradiation upon few-layered graphene using electron-beams and gamma-rays. Yuqing Wang; Yi Feng; Fei Mo; Gang Qian; Yangming Chen; Dongbo Yu; Yang Wang; Xuebin Zhang // Applied Physics Letters;7/14/2014, Vol. 105 Issue 2, p1 

    Few-layered graphene (FLG) is irradiated by electron beams and gamma rays. After 100 keV electron irradiation, the edges of FLG start bending, shrinking, and finally generate gaps and carbon onions due to sputtering and knock-on damage mechanism. When the electron beam energy is increased...

  • Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams. Tanaka, M.; Chu, F.; Shimojo, M.; Takeguchi, M.; Mitsuishi, K.; Furuya, K. // Journal of Materials Science;May2006, Vol. 41 Issue 9, p2667 

    Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO)5 was performed on both Si (111) and (110) substrates at 673–873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide...

  • Linear and nonlinear optical properties of layered structures in 1D. Bertolotti, M. // AIP Conference Proceedings;2001, Vol. 560 Issue 1, p1 

    An introduction of photonic band-gap structures is presented discussing the general properties of infinite 1-D systems. Finite systems are then considered together with their linear and nonlinear optical properties.


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics