TITLE

Mo[sub 0.5]Si[sub 0.5]/Si multilayer soft x-ray mirrors, high thermal stability, and normal

AUTHOR(S)
Stock, H.-J.; Kleineberg, U.
PUB. DATE
October 1993
SOURCE
Applied Physics Letters;10/18/1993, Vol. 63 Issue 16, p2207
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Fabricates the Mo[sub 0.5]Si[0.5]/silicon (Si) multilayer soft x-ray mirrors by electron beam evaporation in ultrahigh vacuum. Characteristics of the incidence mirrors; Comparison with multilayers of pure molybdenum (Mo) and Si; Destruction of Mo/Si multilayers at 600 degree Celsius.
ACCESSION #
4233025

 

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