TITLE

Characterization of SiO[sub 2]/Si(100) interface structure of ultrathin SiO[sub 2] films using

AUTHOR(S)
Fukuda, Hisashi; Yasuda, Makoto
PUB. DATE
August 1992
SOURCE
Applied Physics Letters;8/10/1992, Vol. 61 Issue 6, p693
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents information on the chemical bonding states of interfacial oxide layer close to the silicon oxide/silicon interface of ultrathin silicon oxide film. Origin of the interfacial oxide composition; Analysis of the results based on the methods used; Production of nonstoichiometric silicon oxide layer.
ACCESSION #
4232961

 

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