Crystallization-induced stress in silicon thin films

Miura, Hideo; Ohta, Hiroyuki
June 1992
Applied Physics Letters;6/1/1992, Vol. 60 Issue 22, p2746
Academic Journal
Investigates the crystallization-induced stress in silicon thin films. Detection of wafer curvature change using a scanning laser microscope; Evidence on compressive stress in as-deposited amorphous-silicon films; Factors influencing large tensile stress formation during crystallization reaction; Dependence of final residual stress on the film formation process.


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