Very thin oxide film on a silicon surface by ultraclean oxidation

Ohmi, T.; Morita, M.
April 1992
Applied Physics Letters;4/27/1992, Vol. 60 Issue 17, p2126
Academic Journal
Investigates the growth of thin oxide films by ultraclean oxidation method. Characteristics of thin oxide films; Comparison of the current level and barrier height in varying oxides; Basis of the ultraclean oxide growth rate.


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