Formation of p[sup +]n junctions by Si[sup +]+B[sup +] implantation and laser annealing

Juang, M.H.; Cheng, H.C.
April 1992
Applied Physics Letters;4/27/1992, Vol. 60 Issue 17, p2092
Academic Journal
Investigates the formation of p[sub +]n junctions by ion implantation and laser annealing. Presentation of the implants and anneal regimes; Effect of rapid thermal annealing on boron implanted silicon pre-amorphized samples; Role of laser annealing in dopant activation and anomalous diffusion suppression.


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