Photochemical etching of silicon using monochromatic synchrotron radiation

Kitamura, Osamu; Terakado, Shingo
July 1994
Applied Physics Letters;7/11/1994, Vol. 65 Issue 2, p192
Academic Journal
Examines the photochemical etching of single-crystal silicon using monochromatic synchrotron radiation. Comparison of the increases of the irradiation-induced etched depth to the total electron yield spectra; Agreement of the increment and the total electron yield of silicon (Si) ratios; Optical micrograph of the Si surface.


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