Silicon anodic-plasma oxidation during magnetron sputtering of yttria-stabilized zirconia

Beshenkov, V.G.; Marchenko, V.A.
July 1994
Applied Physics Letters;7/11/1994, Vol. 65 Issue 2, p156
Academic Journal
Examines the silicon anodic-plasma oxidation during magnetron sputtering of yttria-stabilized zirconia. Variation of floating potential in space and time; Dependence of the oxidation rate on the current density and the conducted charge; Increase secondary electron emission with primary electron energy.


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