Direct detection of atomic arsenic desorption from Si(100)

Alstrin, April L.; Strupp, Paul G.
August 1993
Applied Physics Letters;8/9/1993, Vol. 63 Issue 6, p815
Academic Journal
Examines the use of photon laser ionization technique to demonstrate the desorption of arsenic atoms from silicon substrate. Utilization of time-of-flight mass spectroscopy to monitor continuous flux of arsenic atoms; Employment of optical pyrometer to calibrate the substrate temperature; Lack of contaminants in the silicon substrate.


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