TITLE

Nano edge roughness in polymer resist patterns

AUTHOR(S)
Yoshimura, Toshiyuki; Shiraishi, Hiroshi
PUB. DATE
August 1993
SOURCE
Applied Physics Letters;8/9/1993, Vol. 63 Issue 6, p764
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the nano edge roughness in negative-type electron beam resist by atomic force microscope. Formation of nano edge roughness by lateral forces on the resist surfaces; Comparison between conventional two-component resist systems; Details on acid diffusion during the post-exposure bake process.
ACCESSION #
4227484

 

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