Low-energy oxygen ion bombardment effect on BaTiO[sub 3] thin films grown by multi-ion-beam

Peng, C.-J.; Hu, H.
August 1993
Applied Physics Letters;8/9/1993, Vol. 63 Issue 6, p734
Academic Journal
Examines the employment of oxygen ion bombardment to modify the physical properties of barium titanate thin films grown by multi-ion-beam reactive sputtering technique. Changes in the void network and grain boundary structures; Variation of the bombarding energy; Impact of oxygen ion bombardment on morphology and dielectric constants of the thin films.


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