Crystallography and electromigration resistance of epitaxial Al films grown on (011)Si

Niwa, H.; Teramae, Satoshi
July 1993
Applied Physics Letters;7/12/1993, Vol. 63 Issue 2, p203
Academic Journal
Investigates the crystallography and electromigration resistance of aluminum films sputtered on (011)silicon substrates. Use of transmission electron microscopy; Effect of temperature and film thickness on crystallography; Formation of film grains during deposition.


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