In situ energy dispersive x-ray reflectivity measurements of H ion bombardment on SiO[sub 2]/Si

Chason, E.; Mayer, T.M.
May 1992
Applied Physics Letters;5/11/1992, Vol. 60 Issue 19, p2353
Academic Journal
Performs in situ energy dispersive X-ray reflectivity measurements of hydrogen bombardment on silicon dioxide/silicon and silicon (Si) thin films. Analysis of the reflectivity using an optical multilayer model; Variation in ion bombardment values in different layer structures; Dependence of clean Si surface bombardment on the ion energy.


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