TITLE

Magnetic multipole-based reactive ion etching reactor

AUTHOR(S)
Singh, B.; Thomas III, J.H.
PUB. DATE
May 1992
SOURCE
Applied Physics Letters;5/11/1992, Vol. 60 Issue 19, p2335
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the addition of a grounded magnetic multipole device to a triode reactor configuration to produce a reactive ion etching tool. Characteristics of the etch reactor; Features of the multipole electrode; Magnitude of low pressure required to produce a uniform, dense plasma.
ACCESSION #
4227355

 

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