TITLE

Buried heterostructure laser fabricated using reactive ion etching and gas source molecular

AUTHOR(S)
Lievin, J.-L.; Le Gouezigou, L.
PUB. DATE
March 1992
SOURCE
Applied Physics Letters;3/9/1992, Vol. 60 Issue 10, p1211
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates a buried heterostructure laser using reactive ion etching for stripe definition and gas source molecular beam epitaxy. Features of the structure design; Exhibition of continuous wave operation; Suitability of the process for integration purposes and high yield wafer processing.
ACCESSION #
4227331

 

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