Etching characteristics of Al[sub x]Ga[sub 1-x]As in (NH[sub 4])[sub 2]S[sub x] solutions

Jong-Wook Seo; Koker, Terry
March 1992
Applied Physics Letters;3/2/1992, Vol. 60 Issue 9, p1114
Academic Journal
Examines the etching characteristics of Al[sub x]Ga[sub 1-x]As in (NH[sub 4])[sub 2]S[sub x] solution. Variation of excess sulfur concentrations and temperatures; Increase of etch rates; Discussion of possible chemical processes involved.


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