Plating-free metal ion implantation utilizing the cathodic vacuum arc as an ion source

Sroda, T.; Meassick, S.
March 1992
Applied Physics Letters;3/2/1992, Vol. 60 Issue 9, p1076
Academic Journal
Demonstrates a plating-free ion-implantation system using the cathodic vacuum arc as pulsed source of metal ions. Incorporation of a direct current target bias and electromagnetic ion-separation mechanism; Analysis of aluminum ions implanted into silicon; Increase of total implanted-ion dose.


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