TITLE

Plating-free metal ion implantation utilizing the cathodic vacuum arc as an ion source

AUTHOR(S)
Sroda, T.; Meassick, S.
PUB. DATE
March 1992
SOURCE
Applied Physics Letters;3/2/1992, Vol. 60 Issue 9, p1076
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates a plating-free ion-implantation system using the cathodic vacuum arc as pulsed source of metal ions. Incorporation of a direct current target bias and electromagnetic ion-separation mechanism; Analysis of aluminum ions implanted into silicon; Increase of total implanted-ion dose.
ACCESSION #
4227286

 

Related Articles

  • Refractory metal silicides synthesized by metal vapor vacuum arc ion source implantation. Zhu, D. H.; Liu, B. X. // Journal of Applied Physics;4/15/1995, Vol. 77 Issue 8, p3690 

    Provides information on a study that synthesized refractory metal silicides by using a metal vapor vacuum arc ion source to implant the respective metal ions with high current density silicon and silicon wafers. Methodology of the study; Results and discussion on the study; Conclusion.

  • Unfiltered Aluminium Vacuum Arc Plasma Application for Highfrequency Short-pulse Plasma Immersion Ion Implantation. Alexander, RYABCHIKOV; Denis, SIVIN; Anna, BUMAGINA; Evgeniy, BOLBASOV; Natalya, DANEIKINA // Advanced Materials Research;2014, Issue 880, p155 

    This paper is devoted to the studying of the dynamical changes in the density of aluminium microparticles (MPs) on the substrate surface made of stainless steel, immersed in vacuum arc plasma, at high-frequency short-pulse negative bias potential. It is shown experimentally that the density of...

  • Flexible system for multiple plasma immersion ion implantation-deposition processes. Tian, Xiubo; Fu, Ricky k. Y.; Chu, Paul K.; Anders, Andre; Chunzhi Gong, Andre; Shiqin Yang, Andre // Review of Scientific Instruments;Dec2003, Vol. 74 Issue 12, p5137 

    Multiple plasma immersion ion implantation-deposition offers better flexibility compared to other thin film deposition techniques with regard to process optimization. The plasmas may be based on either cathodic arc plasmas (metal ions) or gas plasmas (gas ions) or both of them. Processing...

  • Effect of sheath evolution on metal ion implantation in a vacuum arc plasma source. Bilek, M. M. M. // Journal of Applied Physics;1/15/2001, Vol. 89 Issue 2, p923 

    Plasma immersion ion implantation is a surface modification technique in which ions to be implanted are drawn directly from surrounding plasma by a pulse biased substrate. Ion acceleration occurs in the electric sheath that forms around the substrate. The technique is most often used to implant...

  • Hybrid Method for the Formation of Biocomposites on the Surface of Stainless Steel Implants. Tverdokhlebov, Sergei I.; Ignatov, Viktor P.; Stepanov, Igor B.; Sivin, Denis O.; Petlin, Danila G. // Engineering;Oct2012, Vol. 4 Issue 10, p613 

    This study reports a hybrid method which allows the formation of biocomposites on stainless steel implants. The main idea of the method is to create multilayer coatings consisting of titanium primer layer and a microarc calcium-phosphate coating. The titanium layer is deposited from plasma of...

  • Synthesis of β- and α-FeSi2 phases by Fe ion implantation into Si using metal vapor vacuum arc ion source. Liu, B. X.; Zhu, D. H.; Lu, H. B.; Pan, F.; Tao, K. // Journal of Applied Physics;4/15/1994, Vol. 75 Issue 8, p3847 

    Focuses on a study which synthesized iron silicide layers on silicon wafers by iron (Fe) ion implantation technique using metal vapor vacuum arc ion source. Materials and procedure; Description of the formation of Fe silicides; Discussion on the formation mechanism in terms of the beam heating...

  • Characteristics and design of metal vacuum arc plasma source power supply for pulsed-mode plasma immersion ion implantation. Wang, L. P.; Wang, L.P.; Gan, K. Y.; Gan, K.Y.; Tian, X. B.; Tian, X.B.; Tang, B. Y.; Tang, B.Y.; Chu, P. K.; Chu, P.K. // Review of Scientific Instruments;Dec2000, Vol. 71 Issue 12 

    Metal vacuum arc plasma sources enhance the capability of plasma immersion ion implantation (PIII) by providing a convenient and efficient means by which to introduce metallic ions into the plasma for metallic ion implantation and/or thin film deposition. The power supply of a metal vacuum arc...

  • Investigations Of A Pulsed Cathodic Vacuum Arc. Oates, T. W. H.; Pigott, J.; Denniss, P.; Mckenzie, D. R.; Bilek, M. M. M. // AIP Conference Proceedings;2003, Vol. 669 Issue 1, p319 

    Cathodic vacuum arcs are well established as a method for producing thin films for coatings and as a source of metal ions. Research into DC vacuum arcs has been going on for over ten years in the School of Physics at the University of Sydney. Recently a project was undertaken in the school to...

  • Development of vacuum arc ion sources for heavy ion accelerator injectors and ion implantation technology (invited). Oks, Efim M. // Review of Scientific Instruments;Feb1998, Vol. 69 Issue 2, p776 

    Examines the development of vacuum arc ion sources for heavy ion accelerator injectors and ion implantation technology. Importance of enhancing the fractions of multiple charged ions in particle accelerator ion injection; Need to increase the dose rate for material surface implantation;...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics