TITLE

Kinetics of particle generation in sputtering and reactive ion etching plasmas

AUTHOR(S)
Yoo, W.J.; Steinbruchel, Ch.
PUB. DATE
March 1992
SOURCE
Applied Physics Letters;3/2/1992, Vol. 60 Issue 9, p1073
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates particle formation from a silicon substrate in an argon sputtering and reactive ion etching plasmas. Use of laser light scattering; Study of the kinetics of particle growth; Observation of threshold behavior for particle generation; Detection of smallest particle size.
ACCESSION #
4227285

 

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