Thermodynamic guidance for implantation treatments to improve coating-substrate adhesion

Singer, I.L.; Fayeulle, S.
December 1994
Applied Physics Letters;12/19/1994, Vol. 65 Issue 25, p3191
Academic Journal
Examines the use of ion implanted aluminum atoms to promote adhesion between silicon carbide substrate and Al[sub 2]O[sub 3] coating. Use of ternary and quaternary phase diagrams to help choose and implant aluminum atoms; Mechanism of aluminum diffusion as revealed by Auger sputter depth profiles; Identification of the interface phase as mullite.


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