Low-temperature plasma enhanced chemical vapor deposition of SiO[sub 2]

Deshmukh, Shashank C.; Aydil, Eray S.
December 1994
Applied Physics Letters;12/19/1994, Vol. 65 Issue 25, p3185
Academic Journal
Examines the conditions enhancing the chemical vapor deposition of silica thin films. Quality of films deposited in a helical resonator plasma reactor from tetraethylortosilicate and oxygen discharge; Methods used to characterize the films; Comparison of thermally grown silica with high temperature deposited films.


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