Electrical characterization of an ultrahigh concentration boron delta-doping layer

Weir, B.E.; Feldman, L.C.
August 1994
Applied Physics Letters;8/8/1994, Vol. 65 Issue 6, p737
Academic Journal
Examines the electrical characteristics of an ultrahigh-concentration boron delta-doping layer in crystalline silicon. Electrical active concentration and mobility of silicon; Fabrication of the structure; Details of the temperature-dependent resistivity measurements.


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