Chemical vapor deposition of copper from Cu[sup +1] precursors in the presence of water vapor

Gelatos, A.V.; Marsh, R.
November 1993
Applied Physics Letters;11/15/1993, Vol. 63 Issue 20, p2842
Academic Journal
Examines the chemical vapor deposition of copper from Cu[sup +1] precursors in the presence of water vapor. Impact of water vapor on deposition rate and nucleation time; Absence of defects in copper films deposited under optimum water conditions; Difference in resistivity decay with and without water.


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