TITLE

Oxygen isotopic exchange between an [sup 18]O[sup +] implanted Si layer and a natural SiO[sub 2]

AUTHOR(S)
Yupu Li; Kilner, J.A.
PUB. DATE
November 1993
SOURCE
Applied Physics Letters;11/15/1993, Vol. 63 Issue 20, p2812
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the effect of silicon dioxide capping layer on the growing buried silicon dioxide layer. Implantation of a silicon wafer at a high temperature; Evidence of diffusional mixing of the oxygen isotopes; Employment of electronic signal gating to reduce crater edge effects.
ACCESSION #
4221537

 

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