TITLE

Low-temperature rapid thermal low pressure metalorganic chemical vapor deposition of Zn-doped

AUTHOR(S)
Katz, A.; Feingold, A.
PUB. DATE
November 1993
SOURCE
Applied Physics Letters;11/1/1993, Vol. 63 Issue 18, p2546
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates the rapid thermal low pressure metalorganic chemical vapor deposition technique of a good quality epitaxial zinc-doped indium phosphorus substrates. Analysis and specification on the layers; Evaluation on optimum growth conditions; Details on the crystallographic defect density and surface morphological particle concentration.
ACCESSION #
4221494

 

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